Research in the field of plasma technologies and thin films
At the Department of Physics, Faculty of Science, UJEP, we have been conducting research in the field of thin film preparation and analysis using physical methods, primarily low-pressure plasma technologies, for more than 30 years.
Currently, we focus mainly on the development of 2D materials using the PVD method with magnetron sputtering. We have long-term experience in the preparation of oxide layers and are able to adapt our equipment to specific tasks thanks to our wide range of equipment for vacuum and plasma processes, including HIPIMS.
We pay great attention to the analysis of materials – both surface and bulk properties. For this purpose, we use X-ray diffraction, fluorescence, and, above all, ESCA spectroscopy with the possibility of Auger analysis. These methods allow us to examine chemical bonds and predict the surface properties of materials.
The research also includes the measurement of optical, electrical, and mechanical properties: surface energy, hardness, friction, and abrasion.
Students from bachelor’s to doctoral programs participate in the research, including students in the Erasmus program. Our goal is to create and comprehensively analyze modern materials, including collaboration with other research institutions.
🎥 Watch the video and take a look at one of our department’s research areas.